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Physics, Semicondcutors, Materials Science

Characterization of deep level defects in Si irradiated with MeV Ar+ ions using constant capacitance time analyzed transient spectroscopy


Journal article


P. Giri, S. Dhar, V. N. Kulkarni, Y. N. Mohapatra
1997

Semantic Scholar DOI
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APA   Click to copy
Giri, P., Dhar, S., Kulkarni, V. N., & Mohapatra, Y. N. (1997). Characterization of deep level defects in Si irradiated with MeV Ar+ ions using constant capacitance time analyzed transient spectroscopy.


Chicago/Turabian   Click to copy
Giri, P., S. Dhar, V. N. Kulkarni, and Y. N. Mohapatra. “Characterization of Deep Level Defects in Si Irradiated with MeV Ar+ Ions Using Constant Capacitance Time Analyzed Transient Spectroscopy” (1997).


MLA   Click to copy
Giri, P., et al. Characterization of Deep Level Defects in Si Irradiated with MeV Ar+ Ions Using Constant Capacitance Time Analyzed Transient Spectroscopy. 1997.


BibTeX   Click to copy

@article{p1997a,
  title = {Characterization of deep level defects in Si irradiated with MeV Ar+ ions using constant capacitance time analyzed transient spectroscopy},
  year = {1997},
  author = {Giri, P. and Dhar, S. and Kulkarni, V. N. and Mohapatra, Y. N.}
}